Changsha xinkang advanced materials co.,ltd specializes in producing high purity Zinc Tin(SnZn) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Product Specification / Models
Composition: Zn:Sn=50/50 or 85/15wt%;
Shape: planar, rotary
Application / Models
Zinc Tin sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Customized service is available
Strict quality control
Authoritative testing and analysis certification
Small order is acceptable
Our company was established by three experienced metal materials engineers at the beginning, after years of development by introducing full production equipments like Vacuum Induction Melt Furnace, Sintering Furnace, Machining equipments, as well as advanced analytic device like ICP-OES and LECO, and the extension of technical and management personnel, now we are able to provide thin film materials customized service directly against user’s request. At present, our products have been exporting to Korea, Japan, Europe and Middle east, and it’s good quality, competitive price and best after-sales service are highly appreciated by our customers.
As a Leader of advanced materials, we always believe that what we have produced is changing the world.
Our main products is classified into pure metal targets and metal alloys targets.
Pure metals targets includes Molybdenum Target, Tungsten Target, Niobium Target, Tantalum Target, Chromium Target, Vanadium Target, Titanium Target, Copper Target, Cobalt Target and Zirconium Target, while metal alloy targets includes: Copper Gallium Alloy Target, Nickel Chromium Alloy Target, Nickel Vanadium Alloy Target, Silicon Aluminum Target, Tin Zinc Alloy Target, Zinc Aluminum Alloy Target and AZO(ZnO/Al2O3) target.